Invention Grant
- Patent Title: Ultrasonic transducer and manufacturing method thereof
- Patent Title (中): 超声波换能器及其制造方法
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Application No.: US11489612Application Date: 2006-07-20
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Publication No.: US07675221B2Publication Date: 2010-03-09
- Inventor: Shuntaro Machida , Hiroyuki Enomoto , Yoshitaka Tadaki , Tatsuya Nagata
- Applicant: Shuntaro Machida , Hiroyuki Enomoto , Yoshitaka Tadaki , Tatsuya Nagata
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2005-258117 20050906
- Main IPC: H01L41/08
- IPC: H01L41/08

Abstract:
Disclosed is an improved construction of an ultrasonic transducer, wherein a charge is not easily injected into an insulating film even when the bottom of a membrane comes in contact with a lower electrode, and a manufacturing method thereof without using the wafer laminating technique. The ultrasonic transducer includes a lower electrode; a cavity layer formed on the first electrode; an insulating film covering the cavity layer; and an upper electrode formed on the insulating film, wherein, the cavity layer includes projections formed into an insulating film protruded from the cavity layer. In addition, an opening is formed into the upper electrode, and this upper electrode having the opening formed therein is deposited at a position not being superposed with the projections of the insulating film when seen from the top.
Public/Granted literature
- US20070052093A1 Ultrasonic transducer and manufacturing method thereof Public/Granted day:2007-03-08
Information query
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