Invention Grant
- Patent Title: Electrical fuse having sublithographic cavities thereupon
- Patent Title (中): 电熔断器具有亚光刻腔
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Application No.: US11828718Application Date: 2007-07-26
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Publication No.: US07675137B2Publication Date: 2010-03-09
- Inventor: Deok-kee Kim , Wai-Kin Li , Haining S. Yang
- Applicant: Deok-kee Kim , Wai-Kin Li , Haining S. Yang
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Yuanmin Cal
- Main IPC: H01L29/93
- IPC: H01L29/93

Abstract:
An electrical fuse and a first dielectric layer thereupon are formed on a semiconductor substrate. Self-assembling block copolymers containing two or more different polymeric block components are applied into a recessed region surrounded by a dielectric template layer. The self-assembling block copolymers are then annealed to form a pattern of multiple circles having a sublithographic diameter. The pattern of multiple circles is transferred into the first dielectric layer by a reactive ion etch, wherein the portion of the first dielectric layer above the fuselink has a honeycomb pattern comprising multiple circular cylindrical holes. A second dielectric layer is formed over the circular cylindrical holes by a non-conformal chemical vapor deposition and sublithographic cavities are formed on the fuselink. The sublithographic cavities provide enhanced thermal insulation relative to dielectric materials to the fuselink so that the electrical fuse may be programmed with less programming current.
Public/Granted literature
- US20090026574A1 ELECTRICAL FUSE HAVING SUBLITHOGRAPHIC CAVITIES THEREUPON Public/Granted day:2009-01-29
Information query
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