Invention Grant
- Patent Title: Thin film transistor substrate and manufacturing method thereof
- Patent Title (中): 薄膜晶体管基板及其制造方法
-
Application No.: US11491013Application Date: 2006-07-21
-
Publication No.: US07675067B2Publication Date: 2010-03-09
- Inventor: Keun-kyu Song , Young-min Kim , Tae-young Choi
- Applicant: Keun-kyu Song , Young-min Kim , Tae-young Choi
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Innovation Counsel LLP
- Priority: KR10-2005-0067516 20050725
- Main IPC: H01L27/12
- IPC: H01L27/12

Abstract:
Embodiments of the invention provide a thin film transistor substrate, comprising: an insulating substrate; a gate wire formed on the insulating substrate; a first gate insulating layer made of an inorganic material, formed on the gate wire and having a first insulating layer contact hole for exposing at least a part of the gate wire; a second gate insulating layer made of an organic material, formed on the first gate insulating film and having a second insulating layer contact hole corresponding to the first insulating layer contact hole; a source electrode and a drain electrode formed on the second gate insulating layer and being aparted from each other to be defining a channel area; and an organic semiconductor layer formed on the channel area.Accordingly, the present invention provides an organic TFT substrate in which a characteristic of a TFT is improved.
Public/Granted literature
- US20070018162A1 Thin film transistor substrate and manufacturing method thereof Public/Granted day:2007-01-25
Information query
IPC分类: