System for modifying small structures using localized charge transfer mechanism to remove or deposit material

Invention Grant

US07674706B2 System for modifying small structures using localized charge transfer mechanism to remove or deposit material 有权

Title translation: 使用局部电荷转移机制修改小结构以去除或沉积材料的系统

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Patent Title: System for modifying small structures using localized charge transfer mechanism to remove or deposit material
Patent Title (中): 使用局部电荷转移机制修改小结构以去除或沉积材料的系统
Application No.: US11081934

Application Date: 2005-03-16
Publication No.: US07674706B2

Publication Date: 2010-03-09
Inventor: George Y. Gu , Neil J. Bassom , Thomas J. Gannon , Kun Liu
Applicant: George Y. Gu , Neil J. Bassom , Thomas J. Gannon , Kun Liu
Applicant Address: US OR Hillsboro
Assignee: FEI Company
Current Assignee: FEI Company
Current Assignee Address: US OR Hillsboro
Agency: Scheinberg & Griner, LLP
Agent Michael O. Scheinberg; David Griner
Main IPC: H01L21/4763
IPC: H01L21/4763

System for modifying small structures using localized charge transfer mechanism to remove or deposit material

Abstract:

A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.

Abstract(Chinese):

电荷转移机构用于局部沉积或去除小结构的材料。产生局部电化学电池，而不必将整个工件浸入浴中。电荷转移机构可以与带电粒子束或激光系统一起使用以修改小结构，例如集成电路或微机电系统。电荷转移过程可以在空气中或在一些实施方案中在真空室中进行。

Public/Granted literature

US20050227484A1 System for modifying small structures Public/Granted day:2005-10-13

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/02	.半导体器件或其部件的制造或处理
H01L21/04	..至少具有一个跃变势垒或表面势垒的器件，例如PN结、耗尽层、载体集结层
H01L21/34	...具有H01L21/06，H01L21/16及H01L21/18各组不包含的或有或无杂质，例如掺杂材料的半导体的器件
H01L21/46	....用H01L21/36至H01L21/428各组不包含的方法或设备处理半导体材料的（在半导体材料上制作电极的入H01L21/44）
H01L21/461	.....改变半导体材料的表面物理特性或形状的，例如腐蚀、抛光、切割
H01L21/4763	......非绝缘层的沉积，例如绝缘层上的导电层、电阻层；这些层的后处理（电极的制造入H01L21/28）