Invention Grant
- Patent Title: Method of forming a dual gated FinFET gain cell
- Patent Title (中): 形成双门控FinFET增益单元的方法
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Application No.: US12144139Application Date: 2008-06-23
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Publication No.: US07674674B2Publication Date: 2010-03-09
- Inventor: Toshiharu Furukawa , Mark Charles Hakey , David Vaclav Horak , Charles William Koburger, III , Mark Eliot Masters , Peter H. Mitchell
- Applicant: Toshiharu Furukawa , Mark Charles Hakey , David Vaclav Horak , Charles William Koburger, III , Mark Eliot Masters , Peter H. Mitchell
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Wood, Herron & Evans, LLP
- Main IPC: H01L21/8244
- IPC: H01L21/8244

Abstract:
A memory gain cell for a memory circuit, a memory circuit formed from multiple memory gain cells, and methods of fabricating such memory gain cells and memory circuits. The memory gain cell includes a storage device capable of holding a stored electrical charge, a write device, and a read device. The read device includes a fin of semiconducting material, electrically-isolated first and second gate electrodes flanking the fin, and a source and drain formed in the fin adjacent to the first and the second gate electrodes. The first gate electrode is electrically coupled with the storage device. The first and second gate electrodes are operative for gating a region of the fin defined between the source and the drain to thereby regulate a current flowing from the source to the drain. When gated, the magnitude of the current is dependent upon the electrical charge stored by the storage device.
Public/Granted literature
- US20080261363A1 DUAL GATED FINFET GAIN CELL Public/Granted day:2008-10-23
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