Invention Grant
US07674639B2 GaN based LED with etched exposed surface for improved light extraction efficiency and method for making the same 失效
具有蚀刻暴露表面的GaN基LED,以提高光提取效率及其制备方法

  • Patent Title: GaN based LED with etched exposed surface for improved light extraction efficiency and method for making the same
  • Patent Title (中): 具有蚀刻暴露表面的GaN基LED,以提高光提取效率及其制备方法
  • Application No.: US11504435
    Application Date: 2006-08-14
  • Publication No.: US07674639B2
    Publication Date: 2010-03-09
  • Inventor: Steven D. Lester
  • Applicant: Steven D. Lester
  • Applicant Address: US CA Sunnyvale
  • Assignee: Bridgelux, Inc
  • Current Assignee: Bridgelux, Inc
  • Current Assignee Address: US CA Sunnyvale
  • Agent Calvin B. Ward
  • Main IPC: H01L21/00
  • IPC: H01L21/00
GaN based LED with etched exposed surface for improved light extraction efficiency and method for making the same
Abstract:
A light-emitting device and the method for making the same are disclosed. The device includes a substrate, a light-emitting structure and a light scattering layer. The light-emitting structure includes an active layer sandwiched between a p-type GaN layer and an n-type GaN layer, the active layer emitting light of a predetermined wavelength when electrons and holes from the n-type GaN layer and the p-type GaN layer, respectively, combine therein. The light scattering layer includes a GaN crystalline layer characterized by an N-face surface. The N-face surface includes features that scatter light of the predetermined wavelength. The light-emitting structure is between the N-face surface and the substrate.
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