Invention Grant
- Patent Title: Method of arranging mask patterns
- Patent Title (中): 排列掩模图案的方法
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Application No.: US11164663Application Date: 2005-12-01
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Publication No.: US07674574B2Publication Date: 2010-03-09
- Inventor: Ya-Min Liang , Chien-Kuo He
- Applicant: Ya-Min Liang , Chien-Kuo He
- Applicant Address: TW Taipei
- Assignee: Chunghwa Picture Tubes, Ltd.
- Current Assignee: Chunghwa Picture Tubes, Ltd.
- Current Assignee Address: TW Taipei
- Agent Winston Hsu
- Main IPC: G03C5/00
- IPC: G03C5/00
Abstract:
A method of arranging mask patterns, which includes a first mask has a first mask pattern, a second mask has a second mask pattern. The distance between the first mask boundary and the first mask pattern boundary is different form the distance between the second mask boundary and the second mask pattern boundary.
Public/Granted literature
- US20070128524A1 METHOD OF ARRANGING MASK PATTERNS Public/Granted day:2007-06-07
Information query
