Invention Grant
- Patent Title: Apparatus and method for polishing objects using object cleaners
- Patent Title (中): 使用对象清洁剂抛光物体的设备和方法
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Application No.: US11517903Application Date: 2006-09-08
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Publication No.: US07674154B2Publication Date: 2010-03-09
- Inventor: In Kwon Jeong
- Applicant: In Kwon Jeong
- Applicant Address: US TX Austin
- Assignee: KoMiCo Technology, Inc.
- Current Assignee: KoMiCo Technology, Inc.
- Current Assignee Address: US TX Austin
- Agency: Wilson & Ham
- Agent Thomas H. Ham
- Main IPC: B24B49/00
- IPC: B24B49/00
Abstract:
An apparatus and method for polishing objects, such as semiconductor wafers, uses at least one object cleaner, which may be a movable object cleaner. The movable object cleaner allows access to different parts of the apparatus for maintenance.
Public/Granted literature
- US20070060023A1 Apparatus and method for polishing objects using object cleaners Public/Granted day:2007-03-15
Information query
