Invention Grant
- Patent Title: Optical multilayer filter, method for manufacturing the same, and electronic apparatus
- Patent Title (中): 光学多层滤光器及其制造方法以及电子设备
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Application No.: US11694305Application Date: 2007-03-30
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Publication No.: US07672046B2Publication Date: 2010-03-02
- Inventor: Munehiro Shibuya
- Applicant: Munehiro Shibuya
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-102951 20060404; JP2007-033107 20070214
- Main IPC: F21V9/04
- IPC: F21V9/04 ; G02B1/10
Abstract:
An optical multilayer filter comprises a substrate, and an inorganic thin film that is composed of a plurality of layers and formed on the substrate. An uppermost surface layer of the inorganic thin film is a silicon oxide layer having a density of from 1.9 g/cm3 to 2.2 g/cm3.
Public/Granted literature
- US20070229945A1 OPTICAL MULTILAYER FILTER, METHOD FOR MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS Public/Granted day:2007-10-04
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