Invention Grant
- Patent Title: Spacer forming method and spacer forming apparatus
- Patent Title (中): 间隔成型方法和间隔物形成装置
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Application No.: US10586064Application Date: 2005-10-18
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Publication No.: US07671962B2Publication Date: 2010-03-02
- Inventor: Yasuzo Tanaka , Masao Murata , Junpei Yuyama , Hiroshi Koshina , Hiroto Uchida , Koji Hane , Takanori Tsuji , Mitsuru Yahagi
- Applicant: Yasuzo Tanaka , Masao Murata , Junpei Yuyama , Hiroshi Koshina , Hiroto Uchida , Koji Hane , Takanori Tsuji , Mitsuru Yahagi
- Applicant Address: JP Kanagawa
- Assignee: Ulvac, Inc.
- Current Assignee: Ulvac, Inc.
- Current Assignee Address: JP Kanagawa
- Agency: Carothers & Carothers
- Priority: JP2004-303701 20041019; JP2005-087199 20050324
- International Application: PCT/JP2005/019114 WO 20051018
- International Announcement: WO2006/043545 WO 20060427
- Main IPC: G02F1/1339
- IPC: G02F1/1339 ; B41J29/38

Abstract:
Providing a spacer forming method by which spacers can be securely formed in a predetermined region on a substrate. Ink containing granular spacers is jetted onto a crossing portion of a black matrix 5 in the shape of a lattice. Red pixel R, green pixel G and blue pixel B are formed in the openings of the lattice. The spacer containing ink is jetted onto the spacer forming positions from the nozzle by the ink jetting method. Plural drops of ink 7 are jetted onto each of the spacer forming positions on one of the opposite substrates E. The gap between the opposite substrates E can be securely maintained at a constant for filling with liquid crystal.
Public/Granted literature
- US20070285609A1 Spacer Forming Method and Spacer Forming Apparatus Public/Granted day:2007-12-13
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