Invention Grant
- Patent Title: Method for exposing a substrate and lithographic projection apparatus
- Patent Title (中): 曝光基板和光刻投影装置的方法
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Application No.: US11582566Application Date: 2006-10-18
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Publication No.: US07670731B2Publication Date: 2010-03-02
- Inventor: Jozef Maria Finders , Johannes Anna Quaedackers , Judocus Marie Dominicus Stoeldraijer , Johannes Wilhelmus De Klerk , Alexander Serebryakov
- Applicant: Jozef Maria Finders , Johannes Anna Quaedackers , Judocus Marie Dominicus Stoeldraijer , Johannes Wilhelmus De Klerk , Alexander Serebryakov
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP03255648 20030910
- Main IPC: G03C5/00
- IPC: G03C5/00 ; G03F9/00
Abstract:
A method for improving the uniformity of a lithographic process. In one aspect, the probability density function of a first and second lithographic apparatus are matched by providing a continuous z-motion to a stage in the first lithographic apparatus during substrate exposure. Preferably, the z-motion is characterized by a normally distributed function, wherein the effective probability density function of the first apparatus is substantially similar to the probability density function of the second apparatus.
Public/Granted literature
- US20070099100A1 Method for exposing a substrate and lithographic projection apparatus Public/Granted day:2007-05-03
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