Invention Grant
- Patent Title: Pattern area value calculating method, proximity effect correcting method, and charged particle beam writing method and apparatus
- Patent Title (中): 模式区域值计算方法,邻近效应校正方法和带电粒子束写入方法和装置
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Application No.: US11619383Application Date: 2007-01-03
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Publication No.: US07657863B2Publication Date: 2010-02-02
- Inventor: Tomohiro Iijima , Masafumi Ise
- Applicant: Tomohiro Iijima , Masafumi Ise
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-014881 20060124
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F19/00 ; G03F1/00 ; G21K5/00

Abstract:
A method for calculating area values of a pattern written by using a charged particle beam, includes virtually dividing a pattern into a plurality of mesh-like first square regions surrounded by first grids defined at intervals of a predetermined size, virtually dividing the pattern into a plurality of mesh-like second square regions surrounded by second grids defined at intervals of the predetermined size, wherein the second grids being positionally deviated from the first grids by a half of the predetermined size, distributing an area value of a sub-pattern in each of the second square regions to a plurality of apexes of each of the second square regions such that a center-of-gravity position of the sub-pattern does not change, wherein the sub-pattern being a part of the pattern, and outputting the distributed area values as area values, for correcting a proximity effect, defined at the center position of each of the first square regions.
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