Invention Grant
- Patent Title: Projection lens system
- Patent Title (中): 投影镜头系统
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Application No.: US12233549Application Date: 2008-09-18
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Publication No.: US07656587B2Publication Date: 2010-02-02
- Inventor: Te-Lun Hsu , Chun-Hsiang Huang
- Applicant: Te-Lun Hsu , Chun-Hsiang Huang
- Applicant Address: TW Tu-Cheng, Taipei Hsien
- Assignee: Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: TW Tu-Cheng, Taipei Hsien
- Agent Zhigang Ma
- Priority: CN200810302279 20080623
- Main IPC: G02B3/00
- IPC: G02B3/00 ; G02B9/00 ; G02B9/34 ; G02B15/14

Abstract:
An exemplary projection lens system includes, in order from the magnification side to the reduction side thereof, a first lens with negative refraction power, a second lens with positive refraction power, a third lens with negative refraction power, and a fourth lens with positive refraction power. The projection lens system satisfies the formulae 3.7 1.41; where TT is a total length of the projection lens, f is an effective focal length of the projection lens system and BFL is a back focal length of the projection lens system.
Public/Granted literature
- US20090316276A1 PROJECTION LENS SYSTEM Public/Granted day:2009-12-24
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