Invention Grant
US07656506B2 Lithographic apparatus and device manufacturing method utilizing a substrate handler
有权
利用基板处理器的平版印刷设备和器件制造方法
- Patent Title: Lithographic apparatus and device manufacturing method utilizing a substrate handler
- Patent Title (中): 利用基板处理器的平版印刷设备和器件制造方法
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Application No.: US11320494Application Date: 2005-12-29
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Publication No.: US07656506B2Publication Date: 2010-02-02
- Inventor: Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
- Applicant: Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/42
Abstract:
A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.
Public/Granted literature
- US20060158634A1 Lithographic apparatus and device manufacturing method utilizing a substrate handler Public/Granted day:2006-07-20
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