Invention Grant
- Patent Title: Projection exposure apparatus with luminous flux distribution
- Patent Title (中): 具有光通量分布的投影曝光装置
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Application No.: US08376676Application Date: 1995-01-20
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Publication No.: US07656504B1Publication Date: 2010-02-02
- Inventor: Naomasa Shiraishi
- Applicant: Naomasa Shiraishi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2-309458 19901115; JP2-309459 19901115; JP2-408093 19901227; JP2-408094 19901227; JP2-408095 19901227; JP2-408096 19991227
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G03B27/72
Abstract:
An exposure system is provided for illuminating a fine pattern that may have features extending along orthogonal first and second linear directions. An illumination source may be provided having decreased intensity portions at a center and defined along the first and second directions.
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