Invention Grant
- Patent Title: Display device and manufacturing method of the display device
- Patent Title (中): 显示装置的显示装置及制造方法
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Application No.: US11473265Application Date: 2006-06-23
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Publication No.: US07656468B2Publication Date: 2010-02-02
- Inventor: Keiichirou Ashizawa , Tsutomu Kasai , Masafumi Hirata
- Applicant: Keiichirou Ashizawa , Tsutomu Kasai , Masafumi Hirata
- Applicant Address: JP Chiba
- Assignee: Hitachi Displays, Ltd.
- Current Assignee: Hitachi Displays, Ltd.
- Current Assignee Address: JP Chiba
- Agency: Stites & Harbison PLLC
- Agent Juan Carlos A. Marquez, Esq.
- Priority: JP2005-191364 20050630
- Main IPC: G02F1/1333
- IPC: G02F1/1333 ; G02F1/1368
Abstract:
The present invention enhances a manufacturing yield rate relating to through holes. In a display device which includes a first conductive layer formed on a substrate and a second conductive layer which is formed on the first conductive layer by way of insulation films of two or more layers and connects the first conductive layer and the second conductive layer via a through hole, in the through hole portion, a side surface of an opening formed in the insulation film arranged on the first conductive layer side out of the insulation films of two or more layers includes a portion thereof which is covered with the insulation film arranged on the second conductive layer side out of the insulation films of two or more layers and an exposed portion.
Public/Granted literature
- US20070002200A1 Display device and manufacturing method of the display device Public/Granted day:2007-01-04
Information query
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