Invention Grant
US07655386B2 Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device
有权
具有抗反射性的聚合物，包含其的硬掩模组合物，用于形成图案化材料层的方法和相关联的装置
- Patent Title: Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device
- Patent Title (中): 具有抗反射性的聚合物，包含其的硬掩模组合物，用于形成图案化材料层的方法和相关联的装置
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Application No.: US12003152Application Date: 2007-12-20
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Publication No.: US07655386B2Publication Date: 2010-02-02
- Inventor: Kyung Hee Hyung , Jong Seob Kim , Dong Seon Uh , Chang Il Oh , Kyong Ho Yoon , Min Soo Kim , Jin Kuk Lee
- Applicant: Kyung Hee Hyung , Jong Seob Kim , Dong Seon Uh , Chang Il Oh , Kyong Ho Yoon , Min Soo Kim , Jin Kuk Lee
- Applicant Address: KR Gumi-si, Gyeongsangbuk-do
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-si, Gyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2006-0131034 20061220
- Main IPC: G03F7/40
- IPC: G03F7/40 ; C08G61/12 ; C07C2/88 ; C07F9/40 ; G03F7/11
Abstract:
An antireflective hardmask composition includes an organic solvent, and at least one polymer represented by Formulae A, B or C: In Formulae A and B, the fluorene group is unsubstituted or substituted, in Formula C, the naphthalene group is unsubstituted or substituted, n is at least 1 and is less than about 750, m is at least 1, and m+n is less than about 750, G is an aromatic ring-containing group having an alkoxy group, and R1 is methylene or includes a non-fluorene-containing aryl linking group.
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