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US07655095B2 Method of cleaning semiconductor surfaces 失效
半导体表面的清洁方法

Method of cleaning semiconductor surfaces
Abstract:
Devices and methods of cleaning are described. The methods, and devices formed by the methods have a number of advantages. Embodiments are shown that include cleaning using a supercritical fluid. Advantages include a combination of both chemical and mechanical removal abilities from the supercritical fluid. Mechanical energy for cleaning is transmitted in a homogenous manner throughout a carrier fluid. The mechanical energy provided in methods shown can also be used with delicate surface features.
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