Invention Grant
- Patent Title: Method and apparatus for cleaning a CVD chamber
- Patent Title (中): 用于清洁CVD室的方法和设备
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Application No.: US12372312Application Date: 2009-02-17
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Publication No.: US07654224B2Publication Date: 2010-02-02
- Inventor: Maosheng Zhao , Juan Carlos Rocha-Alvarez , Inna Shmurun , Soova Sen , Mao D. Lim , Shankar Venkataraman , Ju-Hyung Lee
- Applicant: Maosheng Zhao , Juan Carlos Rocha-Alvarez , Inna Shmurun , Soova Sen , Mao D. Lim , Shankar Venkataraman , Ju-Hyung Lee
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan
- Main IPC: H01L21/00
- IPC: H01L21/00 ; C23C16/00
Abstract:
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
Public/Granted literature
- US20090145360A1 METHOD AND APPARATUS FOR CLEANING A CVD CHAMBER Public/Granted day:2009-06-11
Information query
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