Invention Grant
- Patent Title: Substrate processing apparatus and mounter
- Patent Title (中): 基板加工设备和贴片机
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Application No.: US11631518Application Date: 2005-07-01
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Publication No.: US07653989B2Publication Date: 2010-02-02
- Inventor: Takahiko Murata , Shinjiro Tsuji , Kozo Odawara , Ryouichirou Katano
- Applicant: Takahiko Murata , Shinjiro Tsuji , Kozo Odawara , Ryouichirou Katano
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2004-202386 20040708; JP2004-241110 20040820
- International Application: PCT/JP2005/012619 WO 20050701
- International Announcement: WO2006/006509 WO 20060119
- Main IPC: B23P19/00
- IPC: B23P19/00

Abstract:
The final-bonder is equipped with a warping correction unit that is equipped in parallel with a backup stage with a distance of about 20 mm from such backup stage, and that includes accordion pads for sucking a liquid crystal panel; the backup stage that supports, from the back, the liquid crystal panel when pressure is applied to its outer edge portion at the bonding of semiconductor components; and a pressure head that carries out final bonding of the semiconductor components onto the outer edge portion of the liquid crystal panel by applying pressure and heat to them.
Public/Granted literature
- US20080301932A1 Substrate Processing Apparatus and Mounter Public/Granted day:2008-12-11
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