Invention Grant
- Patent Title: Internal conductor connection structure and multilayer substrate
- Patent Title (中): 内部导体连接结构和多层基板
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Application No.: US10595259Application Date: 2005-02-08
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Publication No.: US07652213B2Publication Date: 2010-01-26
- Inventor: Issey Yamamoto , Naoki Kaise , Yutaka Morikita
- Applicant: Issey Yamamoto , Naoki Kaise , Yutaka Morikita
- Applicant Address: JP Kyoto
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Keating & Bennett, LLP
- Priority: JP2004-111976 20040406
- International Application: PCT/JP2005/001815 WO 20050208
- International Announcement: WO2005/101935 WO 20051027
- Main IPC: H01R12/04
- IPC: H01R12/04 ; H05K1/11

Abstract:
A multilayer substrate includes an internal conductor connection structure having first and second via conductors adjacent to each other in the multilayer substrate and a first line conductor disposed in the multilayer substrate. The first via conductor includes a first continuous via conductor arranged to extend in a direction away from the second via conductor, and the first via conductor is connected to the first line conductor through the first continuous via conductor.
Public/Granted literature
- US20070107933A1 Internal conductor connection structure and multilayer substrate Public/Granted day:2007-05-17
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