Invention Grant
US07651736B2 Method of producing a nanohole on a structure by removal of projections and anodic oxidation
失效
通过去除突起和阳极氧化在结构上制造纳米孔的方法
- Patent Title: Method of producing a nanohole on a structure by removal of projections and anodic oxidation
- Patent Title (中): 通过去除突起和阳极氧化在结构上制造纳米孔的方法
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Application No.: US11766908Application Date: 2007-06-22
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Publication No.: US07651736B2Publication Date: 2010-01-26
- Inventor: Aya Imada , Toru Den
- Applicant: Aya Imada , Toru Den
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2006-228364 20060824; JP2007/137225 20070523
- Main IPC: B05D3/00
- IPC: B05D3/00

Abstract:
The present invention provides a method of producing a structure, which is capable of easily obtaining a structure of the nanometer scale by using an anodic oxidation method. A method of producing a structure with a hole includes: forming first projected structures regularly arranged on a substrate; forming a first anodic oxidating layer on the substrate having the first projected structures, thereby forming first recessed structures at center portions of cells formed by the projected structures on the anodic oxidating layer; removing the first projected structures to form holes; and subjecting the first anodic oxidating layer to anodic oxidation to form holes at positions of the first recessed structures.
Public/Granted literature
- US20080050526A1 METHOD OF PRODUCING A STRUCTURE HAVING A HOLE Public/Granted day:2008-02-28
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