Invention Grant
US07647218B2 MOS varactor property detection method and MOS varactor manufacturing method using the same 失效
MOS变容二极管属性检测方法和MOS变容二极管制造方法相同

MOS varactor property detection method and MOS varactor manufacturing method using the same
Abstract:
Disclosed is a method for detecting properties of a Metal Oxide Silicon (MOS) varactor, which includes: establishing a MOS varactor model equation in conjunction with an area of a gate; calculating values of the coefficients of the MOS varactor model equation through measurements for test materials; and extracting the properties of a capacitor of the MOS varactor using the calculated values of the coefficients. According to the method, the MOS varactor model equation can be expressed by Cgate=[Cigate×Area+Cpgate×Perimeter]×N, wherein, Cgate denotes gate capacitance for voltage applied to the gate, Cigate denotes intrinsic gate capacitance, Cpgate denotes perimeter gate capacitance, and N denotes the number of gate fingers. The MOS varactor model equation can be applicable to various sized capacitors, so that it is possible to estimate a gate capacitance for voltage applied to a gate, considering the differences due to the surface shapes of a device.
Information query
Patent Agency Ranking
0/0