Invention Grant
US07647218B2 MOS varactor property detection method and MOS varactor manufacturing method using the same
失效
MOS变容二极管属性检测方法和MOS变容二极管制造方法相同
- Patent Title: MOS varactor property detection method and MOS varactor manufacturing method using the same
- Patent Title (中): MOS变容二极管属性检测方法和MOS变容二极管制造方法相同
-
Application No.: US11585454Application Date: 2006-10-24
-
Publication No.: US07647218B2Publication Date: 2010-01-12
- Inventor: Jung Hyun Choi
- Applicant: Jung Hyun Choi
- Applicant Address: KR Seoul
- Assignee: Dongbu Electronics Co., Ltd.
- Current Assignee: Dongbu Electronics Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Saliwanchik, Lloyd & Saliwanchik
- Priority: KR10-2005-0100143 20051024
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F17/10

Abstract:
Disclosed is a method for detecting properties of a Metal Oxide Silicon (MOS) varactor, which includes: establishing a MOS varactor model equation in conjunction with an area of a gate; calculating values of the coefficients of the MOS varactor model equation through measurements for test materials; and extracting the properties of a capacitor of the MOS varactor using the calculated values of the coefficients. According to the method, the MOS varactor model equation can be expressed by Cgate=[Cigate×Area+Cpgate×Perimeter]×N, wherein, Cgate denotes gate capacitance for voltage applied to the gate, Cigate denotes intrinsic gate capacitance, Cpgate denotes perimeter gate capacitance, and N denotes the number of gate fingers. The MOS varactor model equation can be applicable to various sized capacitors, so that it is possible to estimate a gate capacitance for voltage applied to a gate, considering the differences due to the surface shapes of a device.
Public/Granted literature
- US20070093008A1 MOS varactor property detection method and MOS varactor manufacturing method using the same Public/Granted day:2007-04-26
Information query