Invention Grant
- Patent Title: Nonvolatile semiconductor memory device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US12032206Application Date: 2008-02-15
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Publication No.: US07646646B2Publication Date: 2010-01-12
- Inventor: Yoshikazu Hosomura , Takuya Futatsuyama
- Applicant: Yoshikazu Hosomura , Takuya Futatsuyama
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-035159 20070215
- Main IPC: G11C16/06
- IPC: G11C16/06 ; G11C16/04

Abstract:
According to one embodiment, a nonvolatile semiconductor memory device includes: a memory cell array having: a cell string including a plurality of memory cells connected in series; a plurality of word lines respectively connected to the plurality of memory cells; a source side selecting gate connected to one end of the cell string; and a drain side selecting gate connected to the other end of the cell string; a word line selector that selects one of the word lines connected to a target memory cell to be written; and an equalizing unit that equalizes voltages of the plurality of word lines after data write of the target memory cell is finished.
Public/Granted literature
- US20080198667A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2008-08-21
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