Invention Grant
US07646641B2 NAND flash memory with nitride charge storage gates and fabrication process
有权
NAND闪存与氮化物电荷存储门和制造工艺
- Patent Title: NAND flash memory with nitride charge storage gates and fabrication process
- Patent Title (中): NAND闪存与氮化物电荷存储门和制造工艺
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Application No.: US10869475Application Date: 2004-06-15
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Publication No.: US07646641B2Publication Date: 2010-01-12
- Inventor: Chiou-Feng Chen , Der-Tsyr Fan , Prateep Tuntasood
- Applicant: Chiou-Feng Chen , Der-Tsyr Fan , Prateep Tuntasood
- Applicant Address: US CA Sunnyvale
- Assignee: Silicon Storage Technology, Inc.
- Current Assignee: Silicon Storage Technology, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agent Edward S. Wright
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
NAND flash memory cell array having control gates and charge storage gates stacked in pairs arranged in rows between a bit line diffusion and a common source diffusion, with select gates on both sides of each of the pairs of stacked gates. The gates in each stacked pair are self-aligned with each other, and the charge storage gates are either a nitride or a combination of nitride and oxide. Programming is done by hot electron injection from silicon substrate to the charge storage gates to build up a negative charge in the charge storage gates. Erasing is done by channel tunneling from the charge storage gates to the silicon substrate or by hot hole injection from the silicon substrate to the charge storage gates. The array is biased so that all of the memory cells can be erased simultaneously, while programming is bit selectable.
Public/Granted literature
- US20050276106A1 NAND flash memory with nitride charge storage gates and fabrication process Public/Granted day:2005-12-15
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