Invention Grant
- Patent Title: Positioning apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 定位装置，曝光装置和装置制造方法
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Application No.: US11929375Application Date: 2007-10-30
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Publication No.: US07646488B2Publication Date: 2010-01-12
- Inventor: Zenichi Hamaya
- Applicant: Zenichi Hamaya
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc IP Div
- Priority: JP2006-331158 20061207
- Main IPC: G01B11/02
- IPC: G01B11/02 ; B23Q1/25
Abstract:
A positioning apparatus includes a stage base, a stage moving along a surface of the stage base, a cable having one end connected to the stage, and a straightening structure configured to straighten air currents around the cable. The straightening structure is provided to at least one of the stage and the cable.
Public/Granted literature
- US20080136078A1 POSITIONING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2008-06-12
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