Invention Grant
- Patent Title: Reflectance measuring apparatus
- Patent Title (中): 反射测量装置
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Application No.: US12081179Application Date: 2008-04-11
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Publication No.: US07646487B2Publication Date: 2010-01-12
- Inventor: Kun-Wei Lin , Yi-Hsuan Chiang , Lung-Yu Cheng , Yu-Hsiu Chang
- Applicant: Kun-Wei Lin , Yi-Hsuan Chiang , Lung-Yu Cheng , Yu-Hsiu Chang
- Applicant Address: TW Hsin-Chu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsin-Chu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW96143833A 20071120
- Main IPC: G01N21/55
- IPC: G01N21/55

Abstract:
A reflectance measuring apparatus is provided in the present invention. In addition to measuring the intensity of light directly reflected from a sample, the apparatus is further capable of collecting large-angle reflected light scattered from the sample through a reflecting cover disposed over the sample and measuring the intensity thereof. In one embodiment, the reflecting cover has a parabolic surface for modulating the large-angle reflected light to become parallel light projecting onto a photo-detector. In another embodiment, the reflecting cover has an elliptic surface for modulating the large-angle scattered light to focus on the photo-detector.
Public/Granted literature
- US20090128823A1 Reflectance measuring apparatus Public/Granted day:2009-05-21
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