Invention Grant
- Patent Title: Modulated reflectance measurement system using UV probe
- Patent Title (中): 使用紫外探测器的调制反射测量系统
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Application No.: US12022504Application Date: 2008-01-30
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Publication No.: US07646486B2Publication Date: 2010-01-12
- Inventor: Jon Opsal , Lena Nicolaides , Alex Salnik , Allan Rosencwaig
- Applicant: Jon Opsal , Lena Nicolaides , Alex Salnik , Allan Rosencwaig
- Applicant Address: US CA San Jose
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA San Jose
- Agency: Morrison & Foerster LLP
- Main IPC: G01N21/55
- IPC: G01N21/55

Abstract:
A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.
Public/Granted literature
- US20080158565A1 MODULATED REFLECTANCE MEASUREMENT SYSTEM USING UV PROBE Public/Granted day:2008-07-03
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