Invention Grant
- Patent Title: Semiconductor device, method of manufacturing the same, circuit board, and method of manufacturing the same
- Patent Title (中): 半导体装置及其制造方法,电路基板及其制造方法
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Application No.: US11511503Application Date: 2006-08-29
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Publication No.: US07646079B2Publication Date: 2010-01-12
- Inventor: Mitsuo Umemoto
- Applicant: Mitsuo Umemoto
- Applicant Address: JP Osaka
- Assignee: Sanyo Electric Co., Ltd.
- Current Assignee: Sanyo Electric Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Morrison & Foerster LLP
- Priority: JP2005-252186 20050831
- Main IPC: H01L27/082
- IPC: H01L27/082 ; H01L21/331

Abstract:
In the semiconductor device of the present invention, an active region is formed in an upper surface of a semiconductor substrate, and is surrounded by a trench filled with an oxide. A through-hole electrode electrically connected to the active region extends from the upper surface of the semiconductor substrate to a lower surface thereof. A bottom end of the through-hole electrode juts out of an insulating film covering the lower surface of the semiconductor substrate. Accordingly, a jutting portion of the through-hole electrode is embedded in the bonding material when the semiconductor device is mounted on a mounting board, and thus the connection reliability therebetween is improved.
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