Invention Grant
US07646058B2 Device configuration and method to manufacture trench MOSFET with solderable front metal
失效
用可焊接的前金属制造沟槽MOSFET的器件配置和方法
- Patent Title: Device configuration and method to manufacture trench MOSFET with solderable front metal
- Patent Title (中): 用可焊接的前金属制造沟槽MOSFET的器件配置和方法
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Application No.: US11810327Application Date: 2007-06-05
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Publication No.: US07646058B2Publication Date: 2010-01-12
- Inventor: Fwu-Iuan Hshieh
- Applicant: Fwu-Iuan Hshieh
- Applicant Address: KY
- Assignee: Force-MOS Technology Corporation
- Current Assignee: Force-MOS Technology Corporation
- Current Assignee Address: KY
- Agent Bo-In Lin
- Main IPC: H01L29/732
- IPC: H01L29/732 ; H01L27/088

Abstract:
A vertical semiconductor power device includes a plurality of semiconductor power cells connected to a bottom electric terminal disposed on a bottom surface of a semiconductor substrate and at least a top electrical terminal disposed on a top surface of the substrate and connected to the semiconductor power cells. The top electrical terminal further includes a solderable front metal for soldering to a conductor for providing an electric connection therefrom. In an exemplary embodiment, the conductor soldering to the solderable front metal includes a conductor of a high-heat-conductivity metal plate. In another exemplary embodiment, the conductor soldering to the solderable front metal includes a copper plate. In another exemplary embodiment, the solderable front metal includes a Ti/Ni/Au front metal. In another exemplary embodiment, the solderable front metal includes a Ti/Ni/Ag front metal.
Public/Granted literature
- US20080303081A1 Device configuration and method to manufacture trench mosfet with solderable front metal Public/Granted day:2008-12-11
Information query
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