Invention Grant
US07645708B2 Shadow mask deposition of materials using reconfigurable shadow masks
有权
使用可重构阴影掩模的材料的阴影掩模沉积
- Patent Title: Shadow mask deposition of materials using reconfigurable shadow masks
- Patent Title (中): 使用可重构阴影掩模的材料的阴影掩模沉积
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Application No.: US11820406Application Date: 2007-06-19
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Publication No.: US07645708B2Publication Date: 2010-01-12
- Inventor: Thomas P. Brody
- Applicant: Thomas P. Brody
- Applicant Address: VG Tortola
- Assignee: Advantech Global, Ltd
- Current Assignee: Advantech Global, Ltd
- Current Assignee Address: VG Tortola
- Agency: The Webb Law Firm
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/469

Abstract:
A shadow mask deposition system includes a plurality of identical shadow masks arranged in a number of stacks to form a like number of compound shadow masks, each of which is disposed in a deposition vacuum vessel along with a material deposition source. Materials from the material deposition sources are deposited on the substrate via openings in corresponding compound shadow masks, each opening being formed by the whole or partial alignment of apertures in the shadow masks forming the compound shadow mask, to form an array of electronic elements on the substrate.
Public/Granted literature
- US20070243719A1 Shadow mask deposition of materials using reconfigurable shadow masks Public/Granted day:2007-10-18
Information query
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