Invention Grant
- Patent Title: Photosensitive film
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Application No.: US11558177Application Date: 2006-11-09
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Publication No.: US07645562B2Publication Date: 2010-01-12
- Inventor: Jinko Kimura , Chikara Ishikawa , Youji Tanaka , Shinji Takano , Yoshitaka Minami
- Applicant: Jinko Kimura , Chikara Ishikawa , Youji Tanaka , Shinji Takano , Yoshitaka Minami
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Griffin & Szipl, P.C.
- Priority: JP09/254816 19970919
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004

Abstract:
A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product yield, said film comprising a support film (A), a photosensitive resin composition-containing photosensitive resin layer (B) formed on said support (A) and a protecting film (C) further stuck on said layer (B), wherein the number of fish eyes having a diameter of at least 80 μm included in the protecting film (C) does not exceed 5 fish eyes/m2.
Public/Granted literature
- US20070092835A1 PHOTOSENSITIVE FILM Public/Granted day:2007-04-26
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