Invention Grant
US07645556B2 Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same
失效
用于形成有机绝缘膜的组合物和使用其形成有机绝缘膜的图案的方法
- Patent Title: Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same
- Patent Title (中): 用于形成有机绝缘膜的组合物和使用其形成有机绝缘膜的图案的方法
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Application No.: US11156489Application Date: 2005-06-21
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Publication No.: US07645556B2Publication Date: 2010-01-12
- Inventor: Jung Han Shin , Tae Woo Lee , Bon Won Koo , Bang Lin Lee , Sang Yoon Lee
- Applicant: Jung Han Shin , Tae Woo Lee , Bon Won Koo , Bang Lin Lee , Sang Yoon Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2004-0046177 20040621; KR10-2005-0047107 20050602
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004
Abstract:
A photo-patternable composition for forming an organic insulating film which includes (i) a functional group-containing monomer, (ii) an initiator generating an acid or a radical upon light irradiation, and (iii) an organic or inorganic polymer. Further disclosed is a method for forming a pattern of an organic insulating film using the composition. Since an organic insulating film can be simply patterned without involving any photoresist process, the overall procedure is simplified and eventually an organic thin film transistor with high charge carrier mobility can be fabricated by all wet processes.
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