Invention Grant
US07645492B2 Plasma coating system for accommodating substrates of different shapes
有权
用于容纳不同形状的基板的等离子体涂覆系统
- Patent Title: Plasma coating system for accommodating substrates of different shapes
- Patent Title (中): 用于容纳不同形状的基板的等离子体涂覆系统
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Application No.: US10903360Application Date: 2004-07-30
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Publication No.: US07645492B2Publication Date: 2010-01-12
- Inventor: Steven M. Gasworth
- Applicant: Steven M. Gasworth
- Applicant Address: US MI Wixom
- Assignee: Exatec LLC
- Current Assignee: Exatec LLC
- Current Assignee Address: US MI Wixom
- Agency: Brinks Hofer Gilson & Lione
- Main IPC: B05D1/08
- IPC: B05D1/08 ; C23C4/00 ; C23C16/00
Abstract:
A plasma coating system includes at least one coating station with a first side and a second side defining a pathway with at least one bend. The coating station also includes a first plasma arc that provides a plasma jet directed towards a substrate. The first plasma arc is positioned on either the first side or the second side of the bend.
Public/Granted literature
- US20060021577A1 Plasma coating system for accommodating substrates of different shapes Public/Granted day:2006-02-02
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