Invention Grant
- Patent Title: Manufacturing of magnetic recording medium
- Patent Title (中): 制造磁记录介质
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Application No.: US11415801Application Date: 2006-05-01
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Publication No.: US07645363B2Publication Date: 2010-01-12
- Inventor: Takayuki Ichihara , Yoshinori Honda
- Applicant: Takayuki Ichihara , Yoshinori Honda
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Townsend and Townsend and Crew LLP
- Agent Darren Gold
- Priority: JP2005-135219 20050506
- Main IPC: C23C14/34
- IPC: C23C14/34

Abstract:
A magnetic recording medium having excellent fly-ability and corrosion resistance is provided in a high yield by controlling protuberant on a medium surface caused by deposition of giant silicon oxide particles, which are created during the film deposition of a granular recording layer including Si and oxygen. In one embodiment of the invention, a recording layer is deposited by a sputtering method using a target which is composed of a mixture of an alloy including at least Co and powdered crystalline SiO2.
Public/Granted literature
- US20060249371A1 Manufacturing of magnetic recording medium Public/Granted day:2006-11-09
Information query
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