Invention Grant
US07644447B2 Scanning probe microscope capable of measuring samples having overhang structure
有权
扫描探针显微镜能够测量具有突出结构的样品
- Patent Title: Scanning probe microscope capable of measuring samples having overhang structure
- Patent Title (中): 扫描探针显微镜能够测量具有突出结构的样品
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Application No.: US11601144Application Date: 2006-11-17
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Publication No.: US07644447B2Publication Date: 2010-01-05
- Inventor: Sang-il Park , Yong-Seok Kim , Jitae Kim , Sang Han Chung , Hyun-Seung Shin , Jung-Rok Lee , Euichul Hwang
- Applicant: Sang-il Park , Yong-Seok Kim , Jitae Kim , Sang Han Chung , Hyun-Seung Shin , Jung-Rok Lee , Euichul Hwang
- Applicant Address: KR Seoul
- Assignee: Park Systems Corp.
- Current Assignee: Park Systems Corp.
- Current Assignee Address: KR Seoul
- Agency: Patterson & Sheridan, LLP
- Priority: KR10-2006-0096399 20060929
- Main IPC: G01N23/00
- IPC: G01N23/00

Abstract:
Provided is a scanning probe microscope capable of precisely analyzing characteristics of samples having an overhang surface structure. The scanning probe microscope comprises a first probe, a first scanner changing a position of the first probe along a straight line, and a second scanner changing a position of a sample in a plane, wherein the straight line in which the position of the first probe is changed by using the first scanner is non-perpendicular to the plane in which the position of the sample is changed by using the second scanner.
Public/Granted literature
- US20080078932A1 Scanning probe microscope capable of measuring samples having overhang structure Public/Granted day:2008-04-03
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