Invention Grant
US07643345B2 Semiconductor memory device which includes stacked gate having charge accumulation layer and control gate
有权
半导体存储器件,其包括具有电荷累积层和控制栅极的堆叠栅极
- Patent Title: Semiconductor memory device which includes stacked gate having charge accumulation layer and control gate
- Patent Title (中): 半导体存储器件,其包括具有电荷累积层和控制栅极的堆叠栅极
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Application No.: US11961398Application Date: 2007-12-20
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Publication No.: US07643345B2Publication Date: 2010-01-05
- Inventor: Shigeru Ishibashi
- Applicant: Shigeru Ishibashi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G11C11/34
- IPC: G11C11/34

Abstract:
A semiconductor memory device includes memory cells, a memory cell array, a contact region, and first contact plugs. The memory cells include a control gate and a current path. The memory cells are arranged in the memory cell array in the first direction. The contact region is adjacent to the memory cell array in a second direction orthogonal to the first direction. A terminal portion on one end of the control gate is drawn onto the contact region from within the memory cell array. Each of the first contact plugs is formed on the control gate located in the contact region. The first contact plugs are located so as to alternately sandwich a first axis in the first direction.
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