Invention Grant
- Patent Title: Method and apparatus for detecting defects
- Patent Title (中): 检测缺陷的方法和装置
-
Application No.: US11206209Application Date: 2005-08-18
-
Publication No.: US07643139B2Publication Date: 2010-01-05
- Inventor: Yoshimasa Ohshima , Minori Noguchi , Hiroyuki Nakano
- Applicant: Yoshimasa Ohshima , Minori Noguchi , Hiroyuki Nakano
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2004-283014 20040929
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
An inspection apparatus projects a laser beam on the surface of a SOI wafer and detects foreign matter on and defects in the surface of the SOI wafer by receiving scattered light reflected from the surface of the SOI wafer. The wavelength of the laser beam used by the inspection apparatus is determined so that a penetration depth of the laser beam in a Si thin film may be 10 nm or below to detect only foreign matter on and defects in the outermost surface and not to detect foreign matter and defects in a BOX layer. Only the foreign matter on and defects in the outermost surface layer can be detected without being influenced by thin-film interference by projecting the laser beam on the surface of the SOI wafer and receiving scattered light rays.
Public/Granted literature
- US20060068512A1 Method and apparatus for detecting defects Public/Granted day:2006-03-30
Information query