An exposure apparatus that: projects pattern images onto a substrate via liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate; and exposes the substrate. The apparatus has: a liquid-supplying-section that supplies the liquid onto the substrate; a first pipe section that introduces the liquid to the liquid-supplying-section; and a second pipe section, connected to the first pipe section, that collects the liquid not being supplied to the liquid-supplying-section from the first pipe section. By doing this, it is possible to provide a liquid-immersion exposure apparatus having a liquid-supplying-mechanism, exposure method, and a method for manufacturing devices so as to: restrict the temperature of the liquid, supplied between the projection optical system and the substrate, from varying; and prevent contaminants from invading into the liquid.