An exposure apparatus includes a first driving mechanism which drives a first optical element, a second driving mechanism which drives a second optical element, and a control unit which controls the first driving mechanism and the second driving mechanism so as to adjust the astigmatism of a projection optical system. The amount of change in the first order component of the astigmatism and the amount of change in the second order component of the astigmatism upon driving the first optical element by the first driving mechanism have a first ratio, and the amount of change in the first order component of the astigmatism and the amount of change in the second order component of the astigmatism upon driving the second optical element by the second driving mechanism have a second ratio which is different from the first ratio.