Invention Grant
- Patent Title: Impedance matching apparatus
- Patent Title (中): 阻抗匹配装置
-
Application No.: US12004010Application Date: 2007-12-19
-
Publication No.: US07642879B2Publication Date: 2010-01-05
- Inventor: Daisuke Matsuno
- Applicant: Daisuke Matsuno
- Applicant Address: JP Osaka
- Assignee: Daihen Corporation
- Current Assignee: Daihen Corporation
- Current Assignee Address: JP Osaka
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2004-324531 20041109; JP2005-286882 20050930
- Main IPC: H03H7/38
- IPC: H03H7/38

Abstract:
An impedance matching apparatus 3 calculates a forward wave voltage Vfo and a reflected wave voltage Vro at an output terminal 3b, based on a forward wave voltage Vfi and a reflected wave voltage Vri at an input terminal 3a, on information on variable values of variable capacitors VC1, VC2 acquired in advance through measurement, and on a T parameter of the impedance matching apparatus 3 corresponding to the information on the variable values of variable capacitors VC1, VC2. The impedance matching apparatus 3 calculates an input reflection coefficient Γi at the input terminal 3a corresponding to the information on the variable values of the variable capacitors VC1, VC2, based on the forward wave voltage Vfo, the reflected wave voltage Vro and the T parameter. The impedance matching apparatus 3 selects the lowest absolute value out of absolute values |Γi| of the input reflection coefficients corresponding to the variable values of the variable capacitors VC1, VC2, and adjusts the impedance of the variable capacitors VC1, VC2 based on the lowest value.
Public/Granted literature
- US20080129407A1 Impedance matching apparatus Public/Granted day:2008-06-05
Information query