Invention Grant
- Patent Title: Semiconductor device and fabrication method of same
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US12036703Application Date: 2008-02-25
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Publication No.: US07642604B2Publication Date: 2010-01-05
- Inventor: Yoshifumi Nishi , Takashi Yamauchi , Yoshinori Tsuchiya , Junji Koga
- Applicant: Yoshifumi Nishi , Takashi Yamauchi , Yoshinori Tsuchiya , Junji Koga
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-073839 20070322
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A semiconductor device having an electrode with reduced electrical contact resistance even where either electrons or holes are majority carriers is disclosed. This device has an n-type diffusion layer and a p-type diffusion layer in a top surface of a semiconductor substrate. The device also has first and second metal wires patterned to overlie the n-type and p-type diffusion layers, respectively, with a dielectric layer interposed therebetween, a first contact electrode for electrical connection between the n-type diffusion layer and the first metal wire, and a second contact electrode for connection between the p-type diffusion layer and the second metal wire. The first contact electrode's portion in contact with the n-type diffusion layer and the second contact electrode's portion contacted with the p-type diffusion layer are each formed of a first conductor that contains a metal and a second conductor containing a rare earth metal.
Public/Granted literature
- US20080230804A1 SEMICONDUCTOR DEVICE AND FABRICATION METHOD OF SAME Public/Granted day:2008-09-25
Information query
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