Invention Grant
- Patent Title: Nonvolatile semiconductor memory and method of fabrication thereof
- Patent Title (中): 非易失性半导体存储器及其制造方法
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Application No.: US11878850Application Date: 2007-07-27
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Publication No.: US07642595B2Publication Date: 2010-01-05
- Inventor: Masaru Seto
- Applicant: Masaru Seto
- Applicant Address: JP Tokyo
- Assignee: OKI Semiconductor Co., Ltd.
- Current Assignee: OKI Semiconductor Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Rabin & Berdo, P.C.
- Priority: JP2006-230018 20060828
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
There are provided a nonvolatile semiconductor memory of a structure in which electric signals from peripheral circuits are reliably transferred to control gates via word lines even if contact holes cannot be opened accurately above the word lines, and a method of fabricating the nonvolatile semiconductor memory. Plural word lines and plural bit lines are disposed on a semiconductor substrate, and there are memory cells at intersecting portions of the word lines and the bit lines. At contact portions of the word lines and metal wires of an upper layer, polysilicon regions, which include the contact portions, are formed beneath a polysilicon forming the word lines, as an etching stop layer at a time of forming contacts.
Public/Granted literature
- US20080048238A1 Nonvolatile semiconductor memory and method of fabrication thereof Public/Granted day:2008-02-28
Information query
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