Invention Grant
US07642568B2 Semiconductor device having substrate-driven field-effect transistor and Schottky diode and method of forming the same
有权
具有基板驱动场效应晶体管和肖特基二极管的半导体器件及其形成方法
- Patent Title: Semiconductor device having substrate-driven field-effect transistor and Schottky diode and method of forming the same
- Patent Title (中): 具有基板驱动场效应晶体管和肖特基二极管的半导体器件及其形成方法
-
Application No.: US11876581Application Date: 2007-10-22
-
Publication No.: US07642568B2Publication Date: 2010-01-05
- Inventor: Berinder P. S. Brar , Wonill Ha
- Applicant: Berinder P. S. Brar , Wonill Ha
- Applicant Address: US CA San Jose
- Assignee: Flextronics International USA, Inc.
- Current Assignee: Flextronics International USA, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L31/0328
- IPC: H01L31/0328

Abstract:
A semiconductor device including a substrate-driven field-effect transistor with a lateral channel and a parallel-coupled Schottky diode, and a method of forming the same. In one embodiment, the substrate-driven field-effect transistor of the semiconductor device includes a conductive substrate having a first contact covering a substantial portion of a bottom surface thereof, and a lateral channel above the conductive substrate. The substrate-driven field-effect transistor also includes a second contact above the lateral channel and an interconnect that connects the lateral channel to the conductive substrate operable to provide a low resistance coupling between the first contact and the lateral channel. The semiconductor device also includes a Schottky diode parallel-coupled to the substrate-driven field-effect transistor. A first and second terminal of the Schottky diode are couplable to the first and second contacts, respectively, of the substrate drive field-effect transistor.
Public/Granted literature
Information query
IPC分类: