Invention Grant
- Patent Title: Method to determine a control parameter in a measurement control system
- Patent Title (中): 确定测量控制系统中控制参数的方法
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Application No.: US11226129Application Date: 2005-09-14
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Publication No.: US07642503B2Publication Date: 2010-01-05
- Inventor: Akinori Saito , Kazuhiko Hidaka
- Applicant: Akinori Saito , Kazuhiko Hidaka
- Applicant Address: JP Kawasaki-shi
- Assignee: Mitutoyo Corporation
- Current Assignee: Mitutoyo Corporation
- Current Assignee Address: JP Kawasaki-shi
- Agency: Rankin, Hill & Clark LLP
- Priority: JP2004-268752 20040915; JP2004-268753 20040915
- Main IPC: G06M7/00
- IPC: G06M7/00

Abstract:
N pieces of gains Gi are sequentially and temporarily set in a control circuit (23), and a stylus (131) is brought in contact with a workpiece (W) for conducting a temporary measurement. At this time, a sensor detection signal output from a sensor detection circuit (21) is filtered by a filter (31) to take out only a frequency component corresponding to a frequency of hunting generated in a closed loop (L) including the control circuit (23). Gains Gj that do not generate hunting in the closed loop (L) are extracted, and the largest gain Gj is set in the control circuit (23) in view of enhancement in responsivity etc. of the measurement. Alternatively, by pressing the stylus (131) into the workpiece (W), a displacement signal indicating a pressing amount and a sensor signal output from a sensor (13) are measured in accordance with a measurement load applied to the stylus (131) to calculate a gain Gs′ of the sensor (13) based on the two signals. By compensating the gain of the control circuit in accordance with the gain Gs′, frequency characteristics of the measurement control system can be kept to the largest even when the stylus (131) or the workpiece (W) is replaced with another one having different properties.
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