Invention Grant
- Patent Title: Rotary apertured interferometric lithography (RAIL)
- Patent Title (中): 旋转多孔干涉光刻(RAIL)
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Application No.: US11955905Application Date: 2007-12-13
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Publication No.: US07642041B2Publication Date: 2010-01-05
- Inventor: Koichi Wago
- Applicant: Koichi Wago
- Applicant Address: US CA Scotts Valley
- Assignee: Seagate Technology LLC
- Current Assignee: Seagate Technology LLC
- Current Assignee Address: US CA Scotts Valley
- Agency: Shumaker & Sieffet, P.A.
- Main IPC: G03H1/02
- IPC: G03H1/02

Abstract:
A rotary apertured interferometric lithography (RAIL) system that includes interferometric lithography tools, a mask with a slit preferably with an arc shape, and a rotating stage is disclosed. The RAIL system could create a servo pattern of a recording-head trajectory of a hard disk drive in a master for magnetic-contact printing. The master can could be used to form arrays of sub-micron sized magnetic elements on a magnetic disk media for high-density magnetic recording applications.
Public/Granted literature
- US20080124658A1 ROTARY APERTURED INTERFEROMETRIC LITHOGRAPHY (RAIL) Public/Granted day:2008-05-29
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