Invention Grant
- Patent Title: Method of fabricating periodic domain inversion structure
- Patent Title (中): 周期性域反演结构的制作方法
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Application No.: US11681791Application Date: 2007-03-05
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Publication No.: US07642040B2Publication Date: 2010-01-05
- Inventor: Jyh-Chen Chen , Chang-Hung Chiang , Yeeu-Chang Lee , Cheng-Wei Chien
- Applicant: Jyh-Chen Chen , Chang-Hung Chiang , Yeeu-Chang Lee , Cheng-Wei Chien
- Applicant Address: TW Taoyuan
- Assignee: National Central University
- Current Assignee: National Central University
- Current Assignee Address: TW Taoyuan
- Agency: Jianq Chyun IP Office
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02F2/02

Abstract:
Providing a fabrication method of a periodic domain inversion structure. A nonlinear optical ferroelectric material substrate is provided. A photoresist layer is formed on the upper and the lower surface of the substrate, and periodic gratings formed by interference of two laser beams are employed to expose the photoresist layer on the upper surface. Meanwhile, the two laser beams pass through the substrate, so the periodic gratings are used to expose the photoresist layer on the lower surface. A development process is performed to form a periodic photoresist pattern on the two surfaces of the substrate. A conductive layer is formed above the substrate for covering the photoresist pattern and the surface of the exposed substrate. The photoresist pattern and a portion of the conductive layer thereon are removed by lift-off. A voltage is applied to the substrate via the remaining conductive layer to polarize parts of the substrate.
Public/Granted literature
- US20070298334A1 METHOD OF FABRICATING PERIODIC DOMAIN INVERSION STRUCTURE Public/Granted day:2007-12-27
Information query
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