Invention Grant
- Patent Title: Integrated circuit lithography
- Patent Title (中): 集成电路光刻
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Application No.: US10927898Application Date: 2004-08-27
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Publication No.: US07642037B2Publication Date: 2010-01-05
- Inventor: Bran Ferren , Nathan P. Myhrvold , Lowell L. Wood, Jr.
- Applicant: Bran Ferren , Nathan P. Myhrvold , Lowell L. Wood, Jr.
- Applicant Address: US WA Bellevue
- Assignee: Searete, LLC
- Current Assignee: Searete, LLC
- Current Assignee Address: US WA Bellevue
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20
Abstract:
A method of generating an imaging pattern using a mask having a mathematical (e.g., Fourier-space) representation of an imaging pattern in an imaging plane. In addition to the foregoing, other method aspects are described in the claims, drawings, and text forming a part of the present application. Other methods and apparatuses are also disclosed.
Public/Granted literature
- US20060046212A1 Integrated circuit lithography Public/Granted day:2006-03-02
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