Invention Grant
- Patent Title: Apparatus for processing perfluorocarbon
- Patent Title (中): 全氟化碳加工设备
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Application No.: US11473072Application Date: 2006-06-23
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Publication No.: US07641867B2Publication Date: 2010-01-05
- Inventor: Kazuyoshi Irie , Toshihiro Mori , Hisao Yokoyama , Takayuki Tomiyama , Toshihide Takano , Shin Tamata , Shuichi Kanno
- Applicant: Kazuyoshi Irie , Toshihiro Mori , Hisao Yokoyama , Takayuki Tomiyama , Toshihide Takano , Shin Tamata , Shuichi Kanno
- Applicant Address: JP Tokyo JP Ibaraki JP Ibaraki
- Assignee: Hitachi, Ltd.,Hitachi Engineering Co., Ltd.,Hitachi Kyowa Engineering Co., Ltd.
- Current Assignee: Hitachi, Ltd.,Hitachi Engineering Co., Ltd.,Hitachi Kyowa Engineering Co., Ltd.
- Current Assignee Address: JP Tokyo JP Ibaraki JP Ibaraki
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP9-313089 19971114; JP10-145748 19980527
- Main IPC: B01D53/34
- IPC: B01D53/34 ; B01D50/00

Abstract:
An exhaust gas containing a perfluoride component (PFC) and SiIF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.
Public/Granted literature
- US20060239869A1 Apparatus for processing perfluorocarbon Public/Granted day:2006-10-26
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