Invention Grant
- Patent Title: Method for fabricating a three dimensional emblem
- Patent Title (中): 制造三维标志的方法
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Application No.: US11675695Application Date: 2007-02-16
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Publication No.: US07641839B2Publication Date: 2010-01-05
- Inventor: Ming-Yuan Wu
- Applicant: Ming-Yuan Wu
- Agency: Sinorica, LLC
- Agent Ming Chow
- Main IPC: B29C53/00
- IPC: B29C53/00 ; B29C53/02

Abstract:
A method for fabricating a three dimensional emblem is disclosed. An indentation is formed in the back surface of a piece of transparent material. Multiple colors are printed to form a pattern or emblem in the indentation. After printing, the indentation is filled with resin to make the back surface of the piece of transparent material flat. A second indentation is then formed in the filled indentation. When the front surface of the transparent material is viewed, the emblem appears as a three dimensional emblem. Since the emblem is under the front surface of the transparent material, the three dimensional emblem is protected and cannot be inadvertently dislodged from the transparent material.
Public/Granted literature
- US20080197530A1 METHOD FOR FABRICATING A THREE DIMENSIONAL EMBLEM Public/Granted day:2008-08-21
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